Core鈥搒he
ll nanowires (NWs) composed of si
licon (Si) and germanium (Ge) are key structures for rea
lizing high mobi
lity transistor channe
ls, since the site-se
lective doping and band-offset in core鈥搒he
ll NWs separate the carrier transport region from the impurity doped region, resu
lting in the suppression of impurity scattering. Four different types of Si/Ge (i-Si/n-Ge, p-Si/i-Ge) and Ge/Si (n-Ge/i-Si, i-Ge/p-Si) core鈥搒he
ll NWs structures were rationa
lly grown. The surface morpho
logy significant
ly depended on the types of the core鈥搒he
ll NWs. Raman and X-ray diffraction (XRD) measurements c
lear
ly characterized the compressive and tensi
le stress in the core and she
ll regions. The observation of boron (B) and phosphorus (P)
loca
l vibrationa
l peaks and the Fano effect c
lear
ly demonstrated that the B and P atoms are se
lective
ly doped into the she
ll and core regions and e
lectrica
lly activated in the substitutiona
l sites, showing the success of site-se
lective doping.
Keywords:
ll+nanowires&qsSearchArea=searchText">core鈭抯hell nanowires; doping; X-ray diffraction; Raman scattering