Surface Relief Changes in Cholesteric Cyclosiloxane Oligomer Films at Different Temperatures
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- 作者：Olga V. Sinitsyna ; Alexey Yu. Bobrovsky ; Georgy B. Meshkov ; Igor V. Yaminsky ; Valery P. Shibaev
- 刊名：Journal of Physical Chemistry B
- 出版年：2015
- 出版时间：October 1, 2015
- 年：2015
- 卷：119
- 期：39
- 页码：12708-12713
- 全文大小：391K
- ISSN：1520-5207
文摘
The development of new approaches for the surface topography control is an important topic as the relief significantly affects physical and chemical properties of surfaces. We studied cholesteric cyclosiloxane oligomeric films on which surface focal conic domains with double-helix pattern were observed by means of AFM. In situ investigation of the dependence of the films topography on temperature showed that the surface relief formation can be effectively managed by varying conditions of thermal treatment. Obtained structures can be frozen by cooling the films below glass-transition temperature.