Soft-Etch Mesoporous Hole-Conducting Block Copolymer Templates

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• 作者：Edward J. W. Crossland ; Pedro Cunha ; Steve Scroggins ; Stephen Moratti ; Olena Yurchenko ; Ullrich Steiner ; Marc A. Hillmyer ; Sabine Ludwigs
• 刊名：ACS Nano
• 出版年：2010
• 出版时间：February 23, 2010
• 年：2010
• 卷：4
• 期：2
• 页码：962-966
• 全文大小：286K
• 年卷期：0
• ISSN：1936-086X

文摘

We present a mesoporous hole-conducting polymer film resulting from spontaneous block copolymer self-assembly based on a simple spin-coating protocol. A diblock copolymer consisting of a triphenylamine side group polymer and a poly(an class="smallcaps">dan>,an class="smallcaps">lan>-lactide) block (PSTPA-b-PLA) is shown to microphase separate to form ordered 13 nm cylindrical PLA microdomains embedded in the semiconducting PSTPA matrix. Partially ordered and film-spanning PLA domains could be identified in films immediately after spin coating from toluene solutions on conducting substrates. Selective mild etching of the minority PLA domains (in weak aqueous base) leads to a mesoporous hole-conducting polymer matrix. The pore structure is replicated electrochemically in platinum, demonstrating the viability of this approach to producing nano-organized heterojunction structures in thin films.