Near-Complete Suppression of Surface Recombination in Solar Photoelectrolysis by 鈥淐o-Pi鈥?Catalyst-Modified W:BiVO4
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- 作者：Diane K. Zhong ; Sujung Choi ; Daniel R. Gamelin
- 刊名：Journal of the American Chemical Society
- 出版年：2011
- 出版时间：November 16, 2011
- 年：2011
- 卷：133
- 期：45
- 页码：18370-18377
- 全文大小：979K
- 年卷期：v.133,no.45(November 16, 2011)
- ISSN：1520-5126
文摘
The influence of an earth-abundant water oxidation electrocatalyst (Co-Pi) on solar water oxidation by W:BiVO4 has been studied using photoelectrochemical (PEC) techniques. Modification of W:BiVO4 photoanode surfaces with Co-Pi has yielded a very large (440 mV) cathodic shift in the onset potential for sustained PEC water oxidation at pH 8. PEC experiments with H2O2 as a surrogate substrate have revealed that interfacing Co-Pi with these W:BiVO4 photoanodes almost completely eliminates losses due to surface electron鈥揾ole recombination. The results obtained for W:BiVO4 are compared with those reported recently for Co-Pi/伪-Fe2O3 photoanodes. The low absolute onset potential of 310 mV vs RHE achieved with the Co-Pi/W:BiVO4 combination is promising for overall solar water splitting in low-cost tandem PEC cells, and is encouraging for application of this surface modification strategy to other candidate photoanodes.