Dehydrohalogenation Condensation Reaction of Phenylhydrazine with Cl-Terminated Si(111) Surfaces
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- 作者：Fei Gao ; Andrew V. Teplyakov
- 刊名：Journal of Physical Chemistry C
- 出版年：2016
- 出版时间：March 17, 2016
- 年：2016
- 卷：120
- 期：10
- 页码：5539-5548
- 全文大小：544K
- ISSN：1932-7455
文摘
Formation of stable organic–inorganic contacts with silicon often requires oxygen- and carbon-free interfaces. Some of the general approaches to create such interfaces rely on the formation of a Si–N bond. A reaction of dehydrohalogenation condensation of Cl-terminated Si(111) surface with phenylhydrazine is investigated as a means to introduce a simple function to the surface using a −NH-NH2 moiety as opposed to previously investigated approaches. The use of substituted hydrazine allows for the formation of a stable structure that is less strained compared to the previously investigated primary amines and leads to minimal surface oxidation. The process is confirmed by a combination of infrared studies, X-ray photoelectron spectroscopy, and time-of-flight secondary ion mass spectrometry investigations. Density functional theory is utilized to yield a plausible surface reaction mechanism and provide a set of experimental observables to compare with these data.