UV Plasmonic Resonance of Aluminum Shallow Pit Arrays

详细信息    查看全文

• 作者：Long Cheng ; Liqing Huang ; Xin Li ; Ji Wu ; Yu Zhang ; Jun Wang ; Lin Cheng ; You Liu ; Xuehong Feng ; Weiwei Zhang ; Yakun Cai
• 刊名：Journal of Physical Chemistry C
• 出版年：2015
• 出版时间：June 25, 2015
• 年：2015
• 卷：119
• 期：25
• 页码：14304-14311
• 全文大小：693K
• ISSN：1932-7455

文摘

The UV plasmonic properties of Al shallow pit arrays (ASPA) are investigated by experimental and simulative methods. ASPA with various periods are fabricated by the hard anodization (HA) technique. The measured reflectance spectra of ASPA exhibit a reflectance pit in the UV region, which is red shifted with the increasing period of ASPA and refractive index of the surrounding medium. The dependence of reflectance on the period and refractive index calculated by the finite difference time domain (FDTD) method exhibits the identical evolution trends with measurement results. The angle-dependent reflectance spectrum, spatial electric field, and surface charge distribution calculated by FDTD reveal that ASPA sustains propagating surface plasmons (SPs), the UV reflectance pit corresponds to the propagating SPs mode, and the total field inside the Al shallow pit and its proximity region is enhanced with increasing the period of ASPA, which reveals the origin of the higher sensing performance of ASPA with bigger period and is in accordance with the measured results.