Far-field optical lens resolution is fundamentally limited by diffraction, which typically is about half of the wavelength. This is due to theevanescent waves carrying small scale information from an object that fades away in the far field. A recently proposed superlens theory offersa new approach by surface excitation at the negative index medium. We introduce a far-field optical superlens (FSL) that is capable of imagingbeyond the diffraction limit. The FSL significantly enhances the evanescent waves of an object and converts them into propagating waves thatare measured in the far field. We show that a FSL can image a subwavelength object consisting of two 50 nm wide lines separated by 70 nmworking at 377 nm wavelength. The optical FSL promises new potential for nanoscale imaging and lithography.