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Highly Flexible and Porous Nanoparticle-Loaded Films for Dye Removal by Graphene Oxide–Fungus Interaction
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文摘
Highly flexible and porous films with the ability to load various nanoscale adsorbents are of particular importance in the purification field. Herein, we report the sustainable and large-scale fabrication of a porous and flexible hybrid film based on the graphene oxide/hyphae interaction at a relatively low temperature of 130 °C. Under identical conditions, such films cannot be constructed with solely graphene oxide or hyphae. Moreover, through the addition of nanoscale building blocks [e.g., nanoscale poly(m-phenylenediamine) (PmPD) adsorbents] in the interaction process, the nanoparticles can be in situ loaded into the film. According to FTIR and XPS analyses, the film formation mechanisms mainly involve redox and cross-linking reactions between graphene oxide and fungus hyphae. In a proof-of-concept study, a PmPD nanoparticle-loaded hybrid film was used as a superior key component to build a flow-through adsorption device that displayed a promising adsorption performance toward dye pollutants.

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