Effect of Electric Bias on the Deposition Behavior of ZnO Nanostructures in the Chemical Vapor Deposition Process
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- 作者：Seong-Han Park ; Jin-Woo Park ; Seung-Min Yang ; Kwang-Ho Kim ; Nong-Moon Hwang
- 刊名：Journal of Physical Chemistry C
- 出版年：2015
- 出版时间：November 5, 2015
- 年：2015
- 卷：119
- 期：44
- 页码：25047-25052
- 全文大小：391K
- ISSN：1932-7455
文摘
Much evidence has been reported that charged nanoparticles are generated in the gas phase and contribute to film deposition or nanostructure formation in the chemical vapor deposition (CVD) process. Such a new way of crystal growth with nanoparticles as a building block is closely related to a recently discovered nonclassical crystallization, which has recently attracted great attention. It is often found that deposition does not occur on the substrate even when a huge amount of charged nanoparticles are generated in the gas phase. A drag force exerted on the nanoparticles would be one possibility for such nondeposition. To test such a possibility, an electric bias was applied to the substrate. Under the condition where no deposition occurred on a substrate at 450 掳C, small ZnO nanoparticles were deposited on the substrate when 100 V of direct current (dc) was applied to the substrate. When the bias voltage was increased to 300 V, nanoparticles of a larger size were deposited. When the bias voltage was increased to 600 V, tetrapod ZnO nanoparticles of much larger size were deposited. These results indicate that the drag force becomes an important factor in deposition when nanoparticles are formed in the gas phase.