Correlation of plume dynamics and oxygen pressure with VO2 stoichiometry during pulsed laser deposition

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• 作者：S. Lafane (1)
  T. Kerdja (1)
  S. Abdelli-Messaci (1)
  Y. Khereddine (1)
  M. Kechouane (2)
  O. Nemraoui (3)
  
• 刊名：Applied Physics A: Materials Science & Processing
• 出版年：2013
• 出版时间：July 2013
• 年：2013
• 卷：112
• 期：1
• 页码：159-164
• 全文大小：681KB
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• 作者单位：S. Lafane (1)
  T. Kerdja (1)
  S. Abdelli-Messaci (1)
  Y. Khereddine (1)
  M. Kechouane (2)
  O. Nemraoui (3)
  
  1. Centre de Développement des Technologies Avancées, cité du 20 ao?t 1956, B. P. 17, Baba Hassen, Algiers, Algeria
  2. Université des Sciences et Technologies Houari Boumediene—Faculté de Physique, BP 32 EL ALIA 16111 Bab Ezzouar, Alger, Algérie
  3. Department of Physics and Engineering, University of Zululand, Private Bag X1001, 3886, Kwadlagezwa, South Africa
  
• ISSN：1432-0630

文摘

Vanadium dioxide thin films have been deposited on Corning glass substrates by a KrF laser ablation of V2sub>O5sub> target at the laser fluence of 2?J?cm?. The substrate temperature and the target-substrate distance were set to 500??/sup>C and 4?cm, respectively. X-ray diffraction analysis showed that pure VO2sub> is only obtained at an oxygen pressure range of 4×10?-×10??mbar. A?higher optical switching contrast was obtained for the VO2sub> films deposited at 4×10?-0??mbar. The films properties were correlated to the plume-oxygen gas interaction monitored by fast imaging of the plume.