Surface roughness analysis of SiO2 for PECVD, PVD and IBD on different substrates
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- 作者：Muhammad Rizwan Amirzada ; Andreas Tatzel ; Volker Viereck…
- 关键词：Micro electro mechanical systems ; Plasma ; enhanced chemical vapor deposition ; Physical vapor deposition ; Ion beam deposition ; Surface roughness ; Stylus profilometry ; Atomic force microscopy
- 刊名：Applied Nanoscience
- 出版年：2016
- 出版时间：February 2016
- 年：2016
- 卷：6
- 期：2
- 页码：215-222
- 全文大小：997 KB
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Andreas Tatzel (1)
Volker Viereck (1)
Hartmut Hillmer (1)
1. Institute of Nanostructure Technology and Analytics, Universität Kassel Germany, Heinrich-Plett-Str. 40, 34132, Kassel, Germany - 刊物类别：Chemistry and Materials Science
- 刊物主题：Materials Science
Nanotechnology - 出版者：Springer Berlin / Heidelberg
- ISSN：2190-5517
文摘
This study compares surface roughness of SiO2 thin layers which are deposited by three different processes (plasma-enhanced chemical vapor deposition, physical vapor deposition and ion beam deposition) on three different substrates (glass, Si and polyethylene naphthalate). Plasma-enhanced chemical vapor deposition (PECVD) processes using a wide range of deposition temperatures from 80 to 300 °C have been applied and compared. It was observed that the nature of the substrate does not influence the surface roughness of the grown layers very much. It is also perceived that the value of the surface roughness keeps on increasing as the deposition temperature of the PECVD process increases. This is due to the increase in the surface diffusion length with the rise in substrate temperature. The layers which have been deposited on Si wafer by ion beam deposition (IBD) process are found to be smoother as compared to the other two techniques. The layers which have been deposited on the glass substrates using PECVD reveal the highest surface roughness values in comparison with the other substrate materials and techniques. Different existing models describing the dynamics of clusters on surfaces are compared and discussed. Keywords Micro electro mechanical systems Plasma-enhanced chemical vapor deposition Physical vapor deposition Ion beam deposition Surface roughness Stylus profilometry Atomic force microscopy