Effect of reactive ion etching on the surface of polymethylmethacrylate

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• 作者：A. A. Mironova ; A. M. Popov…
• 关键词：reactive ion etching ; polymethylmethacrylate ; plasma ; microfluidics ; surface roughness
• 刊名：Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques
• 出版年：2015
• 出版时间：May 2015
• 年：2015
• 卷：9
• 期：3
• 页码：457-461
• 全文大小：1,297 KB
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• 作者单位：A. A. Mironova (1)
  A. M. Popov (1)
  M. L. Zanaveskin (1)
  
  1. Kurchatov Centre for Convergence of Nano-, Bio-, Information, and Cognitive Sciences and Technologies, National Research Centre Kurchatov Institute, Moscow, 123098, Russia
  
• 刊物类别：Chemistry and Materials Science
• 刊物主题：Chemistry
  Surfaces and Interfaces and Thin Films
  Russian Library of Science
  
• 出版者：MAIK Nauka/Interperiodica distributed exclusively by Springer Science+Business Media LLC.
• ISSN：1819-7094

文摘

The influence of oxygen-, fluorine-, and argon-containing plasmas on the morphology of the surface of polymethylmethacrylate during reactive ion etching is investigated. A series of experiments on polymer surface etching microns is performed at different gas compositions (O₂, N₂, Ar, O₂/N₂, O₂/Ar, CF₄, and O₂/CF₄). It is demonstrated that the etching depth and surface roughness of the material increase with increasing RF oscillator power and, moreover, depend considerably on the composition and percentage ratio of gases injected into the chamber.