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Fabrication and Characterization of p-Type SnO Thin Film with High c-Axis Preferred Orientation
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  • 作者:Yanli Pei ; Wuguang Liu ; Jingtao Shi ; Zimin Chen
  • 关键词:p ; Type tin monoxide (SnO) ; high c ; axis orientation ; thermal stability
  • 刊名:Journal of Electronic Materials
  • 出版年:2016
  • 出版时间:November 2016
  • 年:2016
  • 卷:45
  • 期:11
  • 页码:5967-5973
  • 全文大小:2,490 KB
  • 刊物类别:Chemistry and Materials Science
  • 刊物主题:Chemistry
    Optical and Electronic Materials
    Characterization and Evaluation Materials
    Electronics, Microelectronics and Instrumentation
    Solid State Physics and Spectroscopy
  • 出版者:Springer Boston
  • ISSN:1543-186X
  • 卷排序:45
文摘
p-Type tin monoxide (SnO) thin films with high c-axis preferred orientation have been fabricated on quartz substrate via electron-beam evaporation at 280°C. Subsequently, rapid thermal annealing (RTA) was performed in N2 atmosphere at 400°C to 800°C. Their structural, chemical, optical, and electrical properties were investigated by x-ray diffraction analysis, ultraviolet–visible spectroscopy, scanning electron microscopy, x-ray photoelectron spectroscopy, and Hall-effect measurements. The c-axis-oriented films of Sn-rich SnO presented excellent thermal stability up to RTA at 700°C. Both the crystallization and the hole Hall mobility were enhanced with increasing RTA temperature, with Hall mobility of 16 cm2 V−1 s−1 being obtained after RTA at 700°C. It was considered that the presence of defects and low scattering from grain boundaries contributed to this high Hall mobility. RTA annealing temperature above 700°C induced chemical reaction between SnO and the quartz substrate, with a change of the film to amorphous state with Sn4+ formation.

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