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Pulsed Laser Deposition of the Ni-Base Superalloy Films
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  • 作者:Joonghan Shin ; Jyotirmoy Mazumder
  • 刊名:Metallurgical and Materials Transactions A
  • 出版年:2016
  • 出版时间:March 2016
  • 年:2016
  • 卷:47
  • 期:3
  • 页码:1240-1247
  • 全文大小:1,567 KB
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  • 作者单位:Joonghan Shin (1)
    Jyotirmoy Mazumder (1)

    1. Center for Lasers and Plasmas for Advanced Manufacturing, University of Michigan, Ann Arbor, MI, 48109-2125, USA
  • 刊物类别:Chemistry and Materials Science
  • 刊物主题:Chemistry
    Materials Science
    Metallic Materials
    Structural Materials
    Physical Chemistry
    Ceramics,Glass,Composites,Natural Materials
  • 出版者:Springer Boston
  • ISSN:1543-1940
文摘
Ni-base superalloy films were deposited on single-crystal (SC) Ni-base superalloy substrates from a target with the same alloy composition by pulsed laser deposition (PLD) technique. Microstructure and growth behavior of the films deposited were investigated by X-ray diffraction and scanning electron microscopy, and atomic force microscope. The homoepitaxial growth of the SC Ni-base superalloy film occurred at the 1123 K (850 °C) substrate temperature and 2 J/cm2 pulse energy. Films generally exhibited a strong polycrystalline characteristic as the substrate temperature and pulse energy increased. The SC film had a smooth surface. The measured root mean square roughness of the SC film surface was ~6 nm. Based on the Taguchi analysis, the substrate temperature and pulse energy were the most significant process parameters influencing the structural characteristics of the films. Also, the influence of the pulse repletion rate and deposition time was not found to be significant. Manuscript submitted July 19, 2015.

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