Importance of the inherent and the relative surface energies in generating patterned layer in a solution process

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• 作者：Do-Kyung Kim ; Hyeok Bin Kwon ; Hongsik Park…
• 关键词：Surface energy control ; Patterning ; Solution process ; MSM structure
• 刊名：Journal of the Korean Physical Society
• 出版年：2016
• 出版时间：March 2016
• 年：2016
• 卷：68
• 期：6
• 页码：786-791
• 全文大小：813 KB
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• 作者单位：Do-Kyung Kim (1)
  Hyeok Bin Kwon (1)
  Hongsik Park (1)
  Eunji Choe (1)
  Jin-Hyuk Bae (1)
  Jaehoon Park (2)
  Seong-Ho Song (2)
  
  1. School of Electronics Engineering, Kyungpook National University, Daegu, 41566, Korea
  2. Department of Electronic Engineering, Hallym University, Chuncheon, 24252, Korea
  
• 刊物主题：Physics, general; Theoretical, Mathematical and Computational Physics; Particle and Nuclear Physics;
• 出版者：Springer Netherlands
• ISSN：1976-8524

文摘

We report the importance of the inherent and the relative surface energies in generating a patterned organic semiconductor layer through a solution process. The inherent and the relative surface energies of the substrate can be effectively controlled using polydimethylsiloxane in combination with an UV/ozone treatment. The controlled inherent surface energy in each region, as well as the high-order difference of relative surface energy, plays a significant role in generating the patterned layer. In addition, the patterned metal-semiconductor-metal (MSM) structure shows a lower lateral current than the non-patterned MSM structure because the current path is limited.