Microstructural evolution of protective La–Cr–O films studied by transmission electron microscopy

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• 作者：Miaofang Chi ; Nigel Browning and Nina Orlovskaya
• 关键词：Interconnect material ; La– ; Cr– ; O thin films ; TEM ; EELS
• 刊名：Journal of Solid State Electrochemistry
• 出版年：2006
• 出版时间：August 2006
• 年：2006
• 卷：10
• 期：8
• 页码：659-662
• 全文大小：253 KB

文摘

Transmission Electron Microscopy (TEM) and Electron Energy Loss Spectroscopy (EELS) were performed to study the microstructural evolution of La–Cr–O thin films deposited by radio frequency (RF)-magnetron sputtering on stainless steel substrates. Chromium L edges and oxygen K edges are analyzed to determine the valence states of the chromium and elucidate the phase evolution of the thin film. The as-deposited amorphous thin film crystallized to LaCrO₄ and finally transformed to the LaCrO₃ stable phase during annealing at 800¡ãC. An intermediate Cr/Mn oxide layer was formed in all annealed samples. The thickness of this oxide layer stabilizes after 700¡ãC, which indicates that the LaCrO₃ thin film plays a role in inhibiting the growth of an oxide layer on the metal surface.