High-Quality Plasmon Sensing with Excellent Intensity Contrast by Dual Narrow-Band Light Perfect absorbers

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• 作者：Xiaoshan Liu ; Guolan Fu ; Mulin Liu ; Guiqiang Liu ; Zhengqi Liu
• 关键词：Plasmonic sensing ; Ultra ; narrowband ; Perfect absorber ; Figure of merit (FOM)
• 刊名：Plasmonics
• 出版年：2017
• 出版时间：February 2017
• 年：2017
• 卷：12
• 期：1
• 页码：65-68
• 全文大小：
• 刊物类别：Chemistry and Materials Science
• 刊物主题：Biotechnology; Nanotechnology; Biophysics and Biological Physics; Biochemistry, general;
• 出版者：Springer US
• ISSN：1557-1963
• 卷排序：12

文摘

A new strategy for realizing ultra-narrowband plasmonic absorber has been theoretically demonstrated. Dual-band perfect light absorber with the bandwidth down to single digit level and the maximal absorption exceeding 99.2 % is achieved. Moreover, novel absorber-based sensor platform with high-quality factors (S > 420 nm/RIU, FOM > 84, and FOM* > 5600) are obtained. These features hold the proposed absorber to be a feasible candidate for applications in the sensing detection and notch filtering.