Thickness Effect of Nb-Doped TiO2 Transparent Conductive Oxide Grown on Glass Substrates Fabricated by RF Sputtering
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- 作者：Zong-Liang Tseng ; Lung-Chien Chen ; Jian-Fu Tang…
- 关键词：TCO ; oxides ; thin films ; sputtering ; electrical properties
- 刊名：Journal of Electronic Materials
- 出版年：2017
- 出版时间：March 2017
- 年：2017
- 卷：46
- 期：3
- 页码：1476-1480
- 全文大小：
- 刊物类别：Chemistry and Materials Science
- 刊物主题：Optical and Electronic Materials; Characterization and Evaluation of Materials; Electronics and Microelectronics, Instrumentation; Solid State Physics;
- 出版者：Springer US
- ISSN：1543-186X
- 卷排序：46
文摘
Transparent conducting Nb-doped titanium oxide (NTO) films were deposited on a non-alkali glass substrate using an RF magnetron sputtering method with post-annealing. Structural, electrical and optical properties of the NTO films were found to be strongly dependent on film thickness. A resistivity of 4.2 × 10−3 Ω cm and an average visible transmittance of ∼70% were obtained at the film thickness of 360 nm, indicating that the polycrystalline NTO fabricated by the sputtering method has sufficient potential as a transparent conducting oxide (TCO) candidate for practical applications.