Characteristics of the Structure and Properties of ZnSnO3 Films by Varying the Magnetron Sputtering Parameters
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- 作者：Fa-Yu Wu ; Jian-Wei Li ; Yi Qi ; Wu-Tong Ding…
- 刊名：Acta Metallurgica Sinica (English Letters)
- 出版年：2016
- 出版时间：September 2016
- 年：2016
- 卷：29
- 期：9
- 页码：827-833
- 全文大小：1,414 KB
- 刊物主题：Metallic Materials; Spectroscopy/Spectrometry; Organometallic Chemistry; Tribology, Corrosion and Coatings; Nanotechnology; Characterization and Evaluation of Materials;
- 出版者：Springer Berlin Heidelberg
- ISSN：2194-1289
- 卷排序：29
文摘
Transparent conductive oxide ZnSnO3 films were prepared by radio-frequency magnetron sputtering from powder targets and were characterized by X-ray photoelectron spectroscopy, X-ray diffraction, transmission electron microscopy, atomic force microscopy, surface profile, UV–Vis spectroscopy, and Hall effect. The structures of the films were either amorphous or nanocrystalline depending on sputtering parameters including deposition time, target power, chamber pressure, and the target–substrate separation. The average transmittance of the ZnSnO3 films within the visible wavelength was approximately 80% and the resistivity of the ZnSnO3 films was in the range of 10−3–10−4 Ω cm. The structural, optical, and electrical properties of the ZnSnO3 films could be adjusted and regulated by optimizing the sputtering process, allowing materials with specific properties to be designed.KeywordsZnSnO3 filmPowder targetMagnetron sputteringOptical propertyElectrical property