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Preparation of silicon carbide-supported vanadium oxide and its application of removing NO by ammonia
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  • 作者:Zi-Bo Wang ; Xu Xu ; Shu-Li Bai ; Yu-Jiang Guan ; Sheng-Tao Jiang
  • 刊名:Applied Physics A
  • 出版年:2017
  • 出版时间:March 2017
  • 年:2017
  • 卷:123
  • 期:3
  • 全文大小:
  • 刊物类别:Physics and Astronomy
  • 刊物主题:Condensed Matter Physics; Optical and Electronic Materials; Nanotechnology; Characterization and Evaluation of Materials; Surfaces and Interfaces, Thin Films; Operating Procedures, Materials Treatment
  • 出版者:Springer Berlin Heidelberg
  • ISSN:1432-0630
  • 卷排序:123
文摘
The aim of this work was to study the preparation of SiC-supported V2O5 catalysts and the kinetics on selective catalytic reduction for NO with NH3 on the catalysts. Using incipient wetness impregnation methods, vanadium oxide was applied to silicon carbide to prepare a SiC-supported vanadium oxide. X-ray photoelectron spectroscopy analysis confirmed that V2O5 existed in the prepared materials. Using the prepared materials as catalysts, selective catalytic reduction for NO by NH3 has been analyzed, and reaction kinetics on the catalysts was studied at 150–300 °C. The obtained results showed that the reduction reaction on the catalysts is close to zero-order kinetics with respect to NH3, first-order with respect to NO, and half-order to O2. Apparent activation energy for the reduction reaction was found to be 38 kJ mol−1. The prepared materials are stable and reusable.

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