文摘
On page 5720, J.-H. Ahn and co-workers demonstrate large area, flexible hybrid complementary metal–oxide–semiconductor (CMOS) logic inverter based on the combination of ultrathin p-channel c-Si nanomembranes and n-channel chemical vapor deposition MoS2 transistors. Such integration of high performance Si technology with transition-metal dichalcogenides offers reliable electrical and mechanical properties and promises a realistic path for the fabrication of flexible/transparent CMOS circuits in 2D electronics.