Swarm Intelligence-Inspired Spontaneous Fabrication of Optimal Interconnect at the Micro/Nanoscale

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• 作者：Meng Su ; Zhandong Huang ; Yong Huang ; Shuoran Chen ; Xin Qian ; Wenbo Li ; Yifan Li ; Weihua Pei ; Hongda Chen ; Fengyu Li and Yanlin Song
• 刊名：Advanced Materials
• 出版年：2017
• 出版时间：February 17, 2017
• 年：2017
• 卷：29
• 期：7
• 全文大小：1412K
• ISSN：1521-4095

文摘

A spontaneous process is demonstrated to assemble nanoparticles into an optimal interconnect, as natural systems spontaneously figure out the shortest path. The optimal interconnect leads to a 65.9% decrease in electromagnetic interference, a 17.1% decrease in delay, and a 24.5% decrease in energy-delay. It will be of great significance for interconnect fabrication of versatile electronic circuits.