Thermally Induced Silane Dehydrocoupling on Silicon Nanostructures

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• 作者：Dr. Dokyoung Kim ; Dr. Jinmyoung Joo ; Dr. Youlin Pan ; Alice Boarino ; Yong Woong Jun ; Prof. Dr. Kyo Han Ahn ; Dr. Barry Arkles and Prof. Dr. Michael J. Sailor
• 刊名：Angewandte Chemie International Edition
• 出版年：2016
• 出版时间：May 23, 2016
• 年：2016
• 卷：55
• 期：22
• 页码：6423-6427
• 全文大小：2617K
• ISSN：1521-3773

文摘

Organic trihydridosilanes can be grafted to hydrogen-terminated porous Si nanostructures with no catalyst. The reaction proceeds efficiently at 80 °C, and it shows little sensitivity to air or water impurities. The modified surfaces are stable to corrosive aqueous solutions and common organic solvents. Octadecylsilane H₃Si(CH₂)₁₇CH₃, and functional silanes H₃Si(CH₂)₁₁Br, H₃Si(CH₂)₉CH=CH₂, and H₃Si(CH₂)₂(CF₂)₅CF₃ are readily grafted. When performed on a mesoporous Si wafer, the perfluoro reagent yields a superhydrophobic surface (contact angle 151°). The bromo-derivative is converted to azide, amine, or alkyne functional surfaces via standard transformations, and the utility of the method is demonstrated by loading of the antibiotic ciprofloxaxin (35 % by mass). When intrinsically photoluminescent porous Si films or nanoparticles are used, photoluminescence is retained in the grafted products, indicating that the chemistry does not introduce substantial nonradiative surface traps.