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Plasmonic refraction-induced ultrahigh transparency of highly conducting metallic networks
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文摘
We demonstrate a high optoelectronic performance and application potential of our random network, with subwavelength diameter, ultralong, and high-quality silver nanowires, stabilized on a substrate with a UV binder. Our networks show very good optoelectronic properties, with the single best figure of merit of ∼1686, and excellent stability under harsh mechanical strain, as well as thermal, and chemical challenge. Our network transparency strongly exceeds the simple shading limit. We show that this transmission enhancement is due to plasmonic refraction, which in an effective medium picture involves localized plasmons, and identify the inhomogeneous broadening as the key factor in promoting this mechanism. Such networks could become a basis for a next generation of ultrahigh-performance transparent conductors.

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