Design and fabrication of UV band-pass filters based on SiO2/Si3N4 dielectric distributed bragg reflectors
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- 作者：Jiangping Dai ; Wang Gao ; Bin Liu ; bliu@nju.edu.cn" class="auth_mail" title="E-mail the corresponding author ; Xianlei Cao ; Tao Tao ; Zili Xie ; Hong Zhao ; Dunjun Chen ; Han Ping ; Rong Zhang
- 关键词：Distributed Bragg reflector ; Ultraviolet band-pass filter ; Plasma-enhanced chemical deposition ; Surface and section morphology ; X-ray photoelectron spectroscopy ; Finite-different time-domain method
- 刊名：Applied Surface Science
- 出版年：2016
- 出版时间：28 February 2016
- 年：2016
- 卷：364
- 期：Complete
- 页码：886-891
- 全文大小：2313 K
文摘
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Tandem dielectric distributed Bragg reflectors were fabricated as UV band-pass filters.
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Varied center wavelengths and passband widths of filters were achieved successfully.
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Transition layer between sub-layers can be proved by XPS analysis clearly.
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The optical performance degradation was discussed by FDTD simulation in detail.
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