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Measurement and characterization of a nano-scale multiple-step height sample using a stylus profiler
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文摘

The three-step height samples were fabricated and measured by the stylus profiler.

A low pass filter was employed to remove high frequency noises.

A ten order polynomial was used to effectively remove the low frequency artefacts.

The measurement uncertainties of the steps were between 1 nm and 2.2 nm.

The deposition rate of the step films with uncertainty was calculated.

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