Photocatalytic activity of TiO₂ films immobilized on aluminum foam by atomic layer deposition technique

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• 作者：Irina Levchuk^a ; ^{irina.levchuk@student.lut.fi" class="auth_mail" title="E-mail the corresponding author} ; Chantal Guillard^b ; Frederic Dappozze^b ; Sté ; phane Parola^c ; Didier Leonard^d ; Mika Sillanpä ; ä ; ^a
• 关键词：Coatings ; Photocatalysis ; Formic acid ; Phenol ; Apparent quantum yield
• 刊名：Journal of Photochemistry & Photobiology, A: Chemistry
• 出版年：2016
• 出版时间：1 September 2016
• 年：2016
• 卷：328
• 期：Complete
• 页码：16-23
• 全文大小：1311 K

文摘

The aim of the this work was to study feasibility of titanium dioxide thin films prepared by atomic layer deposition (ALD) technique on aluminum foam substrates for photocatalysis and compare performance of thin films with commercially available AEROXIDE^® TiO₂. Formic acid and phenol photocatalytic decomposition was monitored using high-pressure liquid chromatography (HPLC). The morphology and thickness of TiO₂ films were characterized by scanning electron microscopy (SEM) and their structure was determined by X-ray diffraction (XRD). Surface of the thin films was characterized with Time-of-Flight Secondary Ion Mass Spectrometry (ToF-SIMS). The amount of TiO₂ deposited on aluminum foam was measured by inductively coupled plasma optical emission spectroscopy (ICP-OES). It was observed that initial rates of formic acid and phenol degradation were 0.007 and 0.001 mmol L⁻¹ min⁻¹, respectively. The apparent quantum yields for formic acid using immobilized and reference TiO₂ powder (AEROXIDE^® TiO₂ P25, Evonik) were 2.2 and 2.7%, correspondingly. While for phenol apparent quantum yield was equal to 0.4% when TiO₂ thin film was used and 0.7% in the case of reference powder. A decrease of the photocatalytic activity of TiO₂ films deposited on aluminum foam was observed after the first cycle for both model compounds. It was suggested from this study that suppression of activity occurs due to detachment of TiO₂ from the surface of thin film.