Local sputter etching by micro plasma jet in SEM

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• 作者：Khanit Matra ; Yusuke Mizobuchi ; Hiroshi Furuta ; Akimitsu Hatta
• 关键词：Micro plasma ; Local sputter etching ; DC discharge ; SEM
• 刊名：Vacuum
• 出版年：2013
• 出版时间：January, 2013
• 年：2013
• 卷：87
• 期：Complete
• 页码：132-135
• 全文大小：515 K

文摘

A local high pressure micro plasma jet was proposed for micro scale local sputter etching in a vacuum system. A small orifice gas nozzle as an anode was placed in a Scanning Electron Microscope (SEM) chamber to produce the local high gas pressure and supply Argon gas for DC plasma generation at a short gap distance. The characteristics of local sputter etching by the micro plasma jet were studied. At DC power of 1.68?mW, a silicon sputtering rate of approximately 0.01?¦Ìm/s was achieved by using an orifice 40?¦Ìm in diameter at 2.5 sccm gas flow rate and 100?¦Ìm gap distance. The sputtered area was 60?¦Ìm in diameter.