Model based prediction of nanostructured thin film morphology in an aerosol chemical vapor deposition process

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• 作者：Tandeep S. Chadha^a ; Mengmeng Yang^a ; ^b ; Kelsey Haddad^a ; Vivek B. Shah^a ; Shuiqing Li^b ; Pratim Biswas^a ; ^{pbiswas@wustl.edu}
• 关键词：Nanostructures ; Chemical vapor deposition ; Computational fluid dynamics ; Modeling ; Aerosol size distribution ; Sintering
• 刊名：Chemical Engineering Journal
• 出版年：2017
• 出版时间：15 February 2017
• 年：2017
• 卷：310
• 期：part_P1
• 页码：102-113
• 全文大小：3485 K
• 卷排序：310

文摘

Model predicting nanostructure formation in an ACVD process is developed. Process parameter-nanostructure morphology relationship understood. Model predictions validated experimentally.