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Photocatalytic oxidation of gas-phase Hg0 on the exposed reactive facets of BiOI/BiOIO3 heterostructures
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文摘
The removal efficiency of the as-prepared BiOI/BiOIO3 photocatalyst reached up to 98.53% and 100% under visible light and UV irradiation respectively. The exposure mechanism of the dominant reactive facets of BiOI/BiOIO3 was analyzed in detail. The mechanism of Hg0 oxidation by BiOI/BiOIO3 was proposed.

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