Low temperature synthesis of Mo₂BC thin films

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• 作者：Hamid Bolvardi ; Jens Emmerlich ; Stanislav Mr¨¢z ; Mirjam Arndt ; Helmut Rudigier ; Jochen M. Schneider
• 关键词：Mo2BC ; Thin films ; High power pulsed magnetron sputtering (HPPMS) ; Low temperature growth ; Crystallization
• 刊名：Thin Solid Films
• 出版年：2013
• 出版时间：2 September, 2013
• 年：2013
• 卷：542
• 期：Complete
• 页码：5-7
• 全文大小：554 K

文摘

Emmerlich et al. [J. Phys. D: Appl. Phys. 2009, p42] reported the formation of Mo₂BC coatings at a substrate temperature of 900 ¡ãC by combinatorial magnetron sputtering. This synthesis temperature limits the choice of substrate materials severely. Here, utilizing high power pulsed magnetron sputtering (HPPMS), the synthesis temperature was reduced to 380 ¡ãC, while the measured elastic modulus and lattice parameters of the as-deposited films are consistent with ab-initio data. Since the crystallization of amorphous Mo₂BC powder was observed at 820 ¡ãC the HPPMS plasma was analyzed to identify the cause of the significantly reduced synthesis temperature. The measured ion current at the substrate and the ion energy distributions are consistent with the notion that energetic ion bombardment of film forming ions as well as Ar⁺ during HPPMS enables surface diffusion and, hence, causes the substantial decrease of the formation temperature of crystalline Mo₂BC to 380 ¡ãC reported here. Thus, low temperature synthesis of Mo₂BC is surface diffusion controlled. The synthesis strategy reported here greatly expands the range of technologically interesting substrate materials for application.