刊名:Physica A: Statistical Mechanics and its Applications
出版年:2017
出版时间:1 April 2017
年:2017
卷:471
期:Complete
页码:569-575
全文大小:714 K
卷排序:471
文摘
The Etching model is improved to reduce large height differences. The overhangs in the Ballistic Deposition model are removed. Modified surfaces lead to good dynamic scaling behavior even on small systems.