Thin film deposition of Ta, TaN and Ta/TaN bi-layer on Ti and SS316-LVM substrates by RF sputtering

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• 作者：A. Jara^a ; B. Fraisse^b ; V. Flaud^b ; N. Fré ; ty^b ; G. Gonzalez^c ; ^{gemagonz@ivic.gob.ve}
• 关键词：Ta ; TaN and Ta/TaN thin films ; Characterization ; RF sputtering
• 刊名：Surface and Coatings Technology
• 出版年：2017
• 出版时间：15 January 2017
• 年：2017
• 卷：309
• 期：Complete
• 页码：887-896
• 全文大小：1587 K
• 卷排序：309

文摘

The nature of the substrate has a strong influence in the Ta phase formed. α-Ta was obtained on SS316L, but β-Ta was formed on Ti and TaN substrates. The substrate affects the microstructure and roughness of the deposited thin film.