Properties of TiO₂ thin films deposited by rf reactive magnetron sputtering on biased substrates

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• 作者：Sawsen Nezar^a ; ^b ; ^{snezar@cdta.dz} ; Nadia Saoula^a ; Samira Sali^c ; Mohammed Faiz^d ; Mogtaba Mekki^d ; Nadia Aï ; cha Laoufi^b ; Nouar Tabet^e
• 关键词：TiO2 thin films ; Magnetron sputtering ; Anatase ; Rutile ; Bias voltage
• 刊名：Applied Surface Science
• 出版年：2017
• 出版时间：15 February 2017
• 年：2017
• 卷：395
• 期：Complete
• 页码：172-179
• 全文大小：1271 K
• 卷排序：395

文摘

TiO2 thin films were deposited on negatively biased substrates by rf magnetron sputtering technique. The bias favors the formation of TiO2 crystalline phase. The roughness of the films increases and the grain size decreases as the bias voltage is varied between (0 and −100 V). XPS reveals the presence of adsorbed humidity of the surface and Ti4+ oxidation state in the as prepared samples.