Silicon nanowires prepared by hydrogen-assisted rf-magnetron sputtering on bismuth-coated ITO glass

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• 作者：Haifeng Wu ; Xiangdong Jiang ; ^{xdjiang@uestc.edu.cn} ; Wei Li ; ^{wli@uestc.edu.cn} ; Jimin Wang ; Yixiong Zeng ; Yangzhou Ming
• 关键词：Magnetron sputtering ; Silicon nanowires ; Bismuth catalyst ; Hydrogen radicals treatment ; VLS mechanism
• 刊名：Materials Letters
• 出版年：2017
• 出版时间：1 February 2017
• 年：2017
• 卷：188
• 期：Complete
• 页码：312-315
• 全文大小：2054 K
• 卷排序：188

文摘

Silicon nanowires(SiNWs) were prepared by rf-magnetron sputtering at 260 ℃. The grown temperature of SiNWs is below the melting point of Si-Bi alloy. The density of SiNWs first rises and then falls as the growing temperature increases. Hydrogen radicals treatment can reduce the synthesis temperature of SiNWs. The nano-crystalline ratio is in inverse proportion to grown temperature in SiNWs.