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Adhesion behavior of diamond-like carbon films with F and Si co-doping prepared by radio frequency reactive magnetron sputtering
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文摘
F and Si co-doped DLC (DLC:F:Si) films with good adherence could be deposited. Bonding configurations were analyzed to reveal the adhesion evolution. The contents of CF and SiC bonds affected clearly adhesion of DLC:F:Si films. A mechanism for RF powers affecting DLC:F:Si films adhesion behavior is proposed.

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