Atomic Layer Deposition from Dissolved Precursors

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• 作者：Yanlin Wu ; Dirk D枚hler ; Ma茂ssa Barr ; Elina Oks ; Marc Wolf ; Lionel Santinacci ; Julien Bachmann
• 刊名：Nano Letters
• 出版年：2015
• 出版时间：October 14, 2015
• 年：2015
• 卷：15
• 期：10
• 页码：6379-6385
• 全文大小：461K
• ISSN：1530-6992

文摘

We establish a novel thin film deposition technique by transferring the principles of atomic layer deposition (ALD) known with gaseous precursors toward precursors dissolved in a liquid. An established ALD reaction behaves similarly when performed from solutions. 鈥淪olution ALD鈥?(sALD) can coat deep pores in a conformal manner. sALD offers novel opportunities by overcoming the need for volatile and thermally robust precursors. We establish a MgO sALD procedure based on the hydrolysis of a Grignard reagent.