Patterned Assembly of Colloidal Particles by Confined Dewetting Lithography

详细信息    查看全文

• 作者：Hugo Celio ; Emily Barton ; Keith J. Stevenson
• 刊名：Langmuir
• 出版年：2006
• 出版时间：December 19, 2006
• 年：2006
• 卷：22
• 期：26
• 页码：11426 - 11435
• 全文大小：1089K
• 年卷期：v.22,no.26(December 19, 2006)
• ISSN：1520-5827

文摘

We report the assembly of colloidal particles into confined arrangements and patterns on various cleaned andchemically modified solid substrates using a method which we term "confined dewetting lithography" or CDL forshort. The experimental setup for CDL is a simple deposition cell where an aqueous suspension of colloidal particles(e.g., polystyrene spheres) is placed between a floating deposition template (i.e., metal microgrid) and the solidsubstrate. The voids of the deposition template serve as an array of micrometer-sized reservoirs where severalhydrodynamic processes are confined. These processes include water evaporation, meniscus formation, convectiveflow, rupturing, dewetting, and capillary-bridge formation. We discuss the optimal conditions where the CDL has ahigh efficiency to deposit intricate patterns of colloidal particles using polystyrene spheres (PS; 4.5, 2.0, 1.7, 0.11,0.064 m diameter) and square and hexagonal deposition templates as model systems. We find that the optimizationconditions of the CDL method, when using submicrometer, sulfate-functionalized PS particles, are primarily dependenton minimizing attractive particle-substrate interactions. The CDL methodology described herein presents a relativelysimple and rapid method to assemble virtually any geometric pattern, including more complex patterns assembledusing PS particles with different diameters, from aqueous suspensions by choosing suitable conditions and materials.