Soft-UV Photolithography using Self-Assembled Monolayers
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- 作者：Kevin Critchley ; Lixin Zhang ; Hitoshi Fukushima ; Masaya Ishida ; Tatsuya Shimoda ; Richard J. Bushby ; Stephen D. Evans
- 刊名：Journal of Physical Chemistry B
- 出版年：2006
- 出版时间：August 31, 2006
- 年：2006
- 卷：110
- 期：34
- 页码：17167 - 17174
- 全文大小：259K
- 年卷期：v.110,no.34(August 31, 2006)
- ISSN：1520-5207
文摘
We report thiol-on-gold self-assembled monolayers (SAMs) that can be photodeprotected using soft UVirradiation (
= 365 nm) to yield CO2H functionalized surfaces complementing those reported previously,which yielded NH2 functionalized surfaces. The photolysis of these SAMs were monitored using a combinationof surface sensitive techniques. In the SAM environment the photodeprotection yields are lower than thoseobtained for equivalent reactions in dilute solution. The protected carboxylic acids SAMs are shown to havea low yield ~50% due to competing photoreduction reactions of the nitro group. The results from infraredstudies show that, as the photolysis progresses, the long chain protected residues reorganize and shield thefunctional COOH groups, thereby reducing the hydrophilic character of the surface.
= 365 nm) to yield CO2H functionalized surfaces complementing those reported previously,which yielded NH2 functionalized surfaces. The photolysis of these SAMs were monitored using a combinationof surface sensitive techniques. In the SAM environment the photodeprotection yields are lower than thoseobtained for equivalent reactions in dilute solution. The protected carboxylic acids SAMs are shown to havea low yield ~50% due to competing photoreduction reactions of the nitro group. The results from infraredstudies show that, as the photolysis progresses, the long chain protected residues reorganize and shield thefunctional COOH groups, thereby reducing the hydrophilic character of the surface.© 2004-2018 中国地质图书馆版权所有 京ICP备05064691号 京公网安备11010802017129号 地址：北京市海淀区学院路29号 邮编：100083 电话：办公室：(+86 10)66554848；文献借阅、咨询服务、科技查新：66554700 |