Electron Tunneling Induced Periodic Nucleation and Growth of Nanoparticles: Physical Basis of Chemical Reduction

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• 作者：Feng Chen ; Hongjun You ; Shengchun Yang ; Zhimao Yang ; Xiaoping Song ; Max G. Lagally ; Bingjun Ding
• 刊名：Crystal Growth & Design
• 出版年：2011
• 出版时间：September 7, 2011
• 年：2011
• 卷：11
• 期：9
• 页码：3707-3712
• 全文大小：969K
• 年卷期：v.11,no.9(September 7, 2011)
• ISSN：1528-7505

文摘

We have developed a periodic nucleation and growth mechanism for nanoparticle-aggregated structure based on electron tunneling process that occurs in chemical replacement reactions. This electron tunneling process, which is a fundamental physical phenomenon, successfully explains the repeated formation of nanoparticles that has been observed in the experiment. Using the nanoparticle-mediated progress, we have interpreted the origin of layer-by-layer nanoparticle stacking polycrystalline nanostructures and mesocrystal in chemical reductions.