Preferential and Reversible Fluorination of Monolayer Graphene

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• 作者：Huaichao Yang ; Minjiang Chen ; Haiqing Zhou ; Caiyu Qiu ; Lijun Hu ; Fang Yu ; Weiguo Chu ; Shuqing Sun ; Lianfeng Sun
• 刊名：Journal of Physical Chemistry C
• 出版年：2011
• 出版时间：September 1, 2011
• 年：2011
• 卷：115
• 期：34
• 页码：16844-16848
• 全文大小：844K
• 年卷期：v.115,no.34(September 1, 2011)
• ISSN：1932-7455

文摘

In this work, we report the layer-dependent fluorination of n-layer graphenes by SF₆ plasma treatment. For monolayer graphene, D, D鈥? and D+G peaks of Raman spectroscopy can be clearly observed, whereas these peaks are absent for thicker n-layer graphenes (n 鈮?2) at the same experimental conditions. This indicates that monolayer graphene is much more susceptible to being fluorinated than thicker graphenes. These results can be well explained by larger corrugations of monolayer graphene than those of thicker graphenes. Meanwhile, the fluorination of n-layer graphenes is reversible after vacuum annealing. These studies provide useful information for exploiting the useful surface information of the fluorination of n-layer graphenes through plasma techniques.