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Synthesis and Characterization of Fluorinated Aminoalkoxide and Iminoalkoxide Gallium Complexes: Application in Chemical Vapor Deposition of Ga2O3 Thin Films
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文摘
Gallium trichloride, GaCl3, reacts with the in situ prepared sodium salt of an aminoalkoxideor iminoalkoxide, denoted as NaL, to give the disubstituted compounds GaL2Cl, where L =OC(CF3)2CH2NMe2 (1), OC(CF3)2CH2C(Me)=NMe (2). Single-crystal X-ray diffraction studieson 1 and 2 indicated the formation of a trigonal-bipyramidal structure with chloride andalkoxy groups occupying the equatorial sites and the nitrogen donors located at the axialpositions. For the related trimethylgallium reagent GaMe3, addition of an equal amount ofamino alcohol LH induced the elimination of methane to afford the complexes GaMe2L, whereL = OC(CF3)2CH2NHMe (3), OC(CF3)2CH2NHBut (4), OC(CF3)2CH2NMe2 (5), in high yields.The crystal structure of 5 was determined by X-ray diffraction, showing a distorted-tetrahedral framework which differs greatly from that observed in the trigonal-bipyramidalGa complexes 1 and 2. Variable-temperature 1H NMR studies on 3 and 4 indicated theoccurrence of rapid NGa bond scission, followed by recoordination with a change of theabsolute configuration. A lower activation barrier was observed for the But complex 4 uponchanging solvents from CDCl3 to more polar media such as deuterated toluene and THF.Complexes 1 and 4 were then evaluated as potential precursor molecules for the chemicalvapor deposition of Ga2O3, and the as-deposited films were analyzed using scanning electronmicrographs (SEM), X-ray photoelectron spectroscopy (XPS), and Rutherford backscattering(RBS).

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