Synthesis and Preparation of Ionically Bound Dendrimer Monolayers and Application toward Scanning Probe Lithography

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• 作者：David C. Tully ; Alexander R. Trimble ; Jean M. J. Fr&eacute ; chet ; Kathryn Wilder ; and Calvin F. Quate
• 刊名：Chemistry of Materials
• 出版年：1999
• 出版时间：October 1999
• 年：1999
• 卷：11
• 期：10
• 页码：2892 - 2898
• 全文大小：205K
• 年卷期：v.11,no.10(October 1999)
• ISSN：1520-5002

文摘

Dendrimer monolayers have been designed for use as positive resists for scanning probelithography (SPL). Several new amphiphilic poly(benzyl ether) dendrimers with carboxylicacids at either the focal point or the "periphery" have been prepared. These can form ionicallybound dendrimer monolayers that may serve as either positive or negative tone resists forSPL. The amphiphilic dendrimers self-assemble onto (3-aminopropyl)silanized Si(100) wafersurfaces to afford ultrathin films. The dendrimer monolayers were characterized by AFM,ellipsometry, and contact angle goniometry. Patterning a singly charged dendrimer monolayerresults in the formation of positive tone holes ~35 nm in width. Similarly, patterning amultiply charged dendrimer monolayer in a direct-write manner with the scanning probemicroscope results in the formation of negative tone oxide features ~80 nm in width.