Dielectric insulator materials containing nanometer-scale closed-cell pores with lowdielectric constants (
k < 2.2), good mechanical properties, and high dielectric breakdownstrengths are required
for
future semiconductor devices. In this paper we present a novelmethod
for preparing nanoporous polyorganosilicate
films, which promise to satis
fy the keyrequirements, via inorganic/organic polymer hybrid templating. The nanometer-scaleinorganic/organic polymer hybrids are generated in situ upon heating mixtures o
f methylsilsesquioxane (MSSQ) prepolymer with star-shaped hydroxy-terminated poly(
fchars/epsilon.gi
f" BORDER=0 >-caprolactone)(PCL) to ~250
f">C, causing chain extension and cross-linking o
f MSSQ. Subsequent heatingto 430
f">C results in the thermal decomposition and volatilization o
f PCL components
fromthe vitri
fied poly(methylsilsesquioxane) (PMSSQ) matrix, leaving behind porous PMSSQ
films with pores with the size and shape o
f the original hybrid morphology. A dielectricconstant as low as 2.1 has been achieved
for closed-cell nanoporous PMSSQ
films withhydrophobic sur
faces and excellent breakdown strengths close to that o
f SiO
2. Moreover,conductance measurements on inorganic/organic polymer hybrids o
ffer insight into thedevelopment o
f interconnected PCL domains as the PCL content is increased above ~25%.