Morphology Control in Block Copolymer Films Using Mixed Solvent Vapors

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• 作者：Kevin W. Gotrik ; Adam F. Hannon ; Jeong Gon Son ; Brent Keller ; Alfredo Alexander-Katz ; Caroline A. Ross
• 刊名：ACS Nano
• 出版年：2012
• 出版时间：September 25, 2012
• 年：2012
• 卷：6
• 期：9
• 页码：8052-8059
• 全文大小：496K
• 年卷期：v.6,no.9(September 25, 2012)
• ISSN：1936-086X

文摘

Solvent vapor annealing of block copolymer thin films can produce a range of morphologies different from the equilibrium bulk morphology. By systematically varying the flow rate of two different solvent vapors (toluene and n-heptane) and an inert gas, phase maps showing the morphology versus vapor pressure of the solvents were constructed for 45 kg/mol polystyrene-block-polydimethylsiloxane diblock copolymer films of different thicknesses. The final morphology was correlated with the swelling of the block copolymer and homopolymer films and the solvent vapor annealing conditions. Self-consistent field theory is used to model the effects of solvent swelling. These results provide a framework for predicting the range of morphologies available under different solvent vapor conditions, which is important in lithographic applications where precise control of morphology and critical dimensions are essential.

Keywords:

cs.org/action/doSearch?action=search&searchText=self%5C-assembly&qsSearchArea=searchText">self-assembly; cs.org/action/doSearch?action=search&searchText=solvent+vapor+annealing&qsSearchArea=searchText">solvent vapor annealing; cs.org/action/doSearch?action=search&searchText=ps%5C-pdms&qsSearchArea=searchText">ps-pdms; cs.org/action/doSearch?action=search&searchText=block+copolymer&qsSearchArea=searchText">block copolymer; cs.org/action/doSearch?action=search&searchText=toluene&qsSearchArea=searchText">toluene; cs.org/action/doSearch?action=search&searchText=heptane&qsSearchArea=searchText">heptane; cs.org/action/doSearch?action=search&searchText=self%5C-consistent+field+theory&qsSearchArea=searchText">self-consistent field theory