文摘
Single-walled carbon nanotubes (SWNTs) grown by chemical vapor deposition (CVD) are widely used for fabrication of high-performance nanotube devices. However, the high-temperature growth is incompatible with the current complementary metal-oxide semiconductor (CMOS) technology. We demonstrate a low-temperature and direct deposition of the CVD-grown SWNTs. The nanotubes are synthesized by floating catalytic CVD technique and further carried by the flowing gas directly to the low-temperature area. Individual SWNTs have been successfully deposited on Si/SiO2 substrates covered with a polymethylmethacrylate layer, which results in a suspended geometry of the nanotube in the fabricated devices. We subsequently investigate the electrical-transport properties of a representative small band gap nanotube, which exhibits an ambipolar feature with p-channel mobility up to 1410 cm2 V鈥? S鈥? at room temperature. Furthermore, low-temperature measurements down to 4 K reveal different transport characteristics with the gate voltage biased near zero or at a large negative value, respectively.