Light-Activated Replication of Block Copolymer Fingerprint Patterns

详细信息    查看全文

• 作者：Dustin W. Janes ; Christopher J. Thode ; C. Grant Willson ; Paul F. Nealey ; Christopher J. Ellison
• 刊名：Macromolecules
• 出版年：2013
• 出版时间：June 11, 2013
• 年：2013
• 卷：46
• 期：11
• 页码：4510-4519
• 全文大小：703K
• 年卷期：v.46,no.11(June 11, 2013)
• ISSN：1520-5835

文摘

A strategy to replicate fingerprint patterns formed by the self-assembly of lamella-forming block copolymer (BCP) was investigated. To accomplish this, liquid conformal layers were placed between the surfaces of a 鈥渕aster鈥?BCP film and a transparent 鈥渞eplica鈥?substrate that solidified and covalently bonded to the BCP upon exposure to light. The benzophenone-containing conformal layer enabled pattern replication over areas limited only by the size of the samples and exposure field. The replication step is light activated, occurs below the glass transition of the BCP, and takes less than 1 h. This demonstration used a poly(styrene-b-methyl methacrylate) BCP with a bulk domain periodicity of 42 nm, but it is possible that the chemistry may be generalized to many other BCPs. Control experiments conducted with alternative conformal layer compositions indicate that interfacial photosensitization of the BCP by excited benzophenone, followed by propagation to residual acrylate groups present in the conformal layer, is the primary mechanism by which pattern replication takes place.