Au nanocrystal array/silicon nanoantennas exhibiting wavelength-selective photocurrent enhancement were successfully fabricated by a facile and inexpensive method combining colloidal lithography (CL) and a metal-assisted chemical etching (MaCE) process. The localized surface plasmon resonance (LSPR) response and wavelength-selective photocurrent enhancement characteristics were achieved by tuning the depth of immersion of Au nanocrystal arrays in silicon through a MaCE process. The wavelength selectivity of photocurrent enhancement contributed by LSPR induced local field amplification was confirmed by simulated near-field distribution. In addition, it can be integrated to well-developed Si-based manufacturing process. These characteristics make Au nanocrystal array/Si nanoantennas promising as low power-consumption photoswitches and nano-optoelectronic and photonic communication devices.
Keywords:
Localized surface plasmon resonance; photoresponce; metal nanocrystal array; metal-assisted chemical etching; degree of immersion