Controlled Formation of Silica Structures Using Siloxane/Block Copolymer Complexes Prepared in Various Solvent Mixtures

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• 作者：Sho Kataoka ; Yasutaka Takeuchi ; Akiko Kawai ; Mitsuhiko Yamada ; Yoshihiro Kamimura ; Akira Endo
• 刊名：Langmuir
• 出版年：2013
• 出版时间：November 5, 2013
• 年：2013
• 卷：29
• 期：44
• 页码：13562-13567
• 全文大小：398K
• 年卷期：v.29,no.44(November 5, 2013)
• ISSN：1520-5827

文摘

Block copolymers exhibit regularly patterned structures induced by microphase separation. Here we present a method for preparing various particulate silica (SiO₂) nanostructures by controlling the microphase separation of block copolymers. In this method, siloxane, a SiO₂ precursor, is adsorbed onto poly(4-vinylpyridine) blocks of polystyrene-block-poly(4-vinylpyridine) in solvent mixtures. After siloxane/polymer complexes are coprecipitated via further siloxane polycondensation, the resulting precipitates are heated to remove the polymer. The results of scanning electron microscopy revealed that SiO₂ formed various structures including cylindrical, spherical, and lamellar. Different SiO₂ nanostructures formed via the microphase separation of siloxane/polymer complexes are prepared simply by varying solvent mixtures without changing the polymer chain. The structural change is interpreted in terms of polymer鈥搒olvent interactions and volume fractions in siloxane/polymer complexes.