Controllable Fabrication of Pyramidal Silicon Nanopore Arrays and Nanoslits for Nanostencil Lithography

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• 作者：Tao Deng ; Mengwei Li ; Jian Chen ; Yifan Wang ; Zewen Liu
• 刊名：Journal of Physical Chemistry C
• 出版年：2014
• 出版时间：August 7, 2014
• 年：2014
• 卷：118
• 期：31
• 页码：18110-18115
• 全文大小：356K
• ISSN：1932-7455

文摘

This paper presents a controllable method for the high-throughout fabrication of pyramidal silicon nanopore arrays (PSNAs). Using this method, square nanopore arrays with an average size of 60 nm, rectangular nanopores with different length鈥搘idth ratios, and nanoslits with feature sizes as small as 13 nm were created. Focused ion beam (FIB) cutting experiments showed that the inner structure of the nanopore was exactly pyramidal, which offered unique ionic rectification properties. Moreover, preliminary nanostencil lithography experiments indicated that such PSNAs could be used as reusable masks to directly deposit large-scale surface patterns in both nano and micro scales, and with less time and low cost.